ECR CVD
Reference: CAI TFQ UII-ECR
ECR CVD
Rates
|
Ref.: CAI TFQ UII-04
User type:
UCM
|
Amount: 10,00€
Charging unit: Preparación equipo
|
|
Ref.: CAI TFQ UII-04
User type:
Public organization
|
Amount: 30,00€
Charging unit: Preparación equipo
|
|
Ref.: CAI TFQ UII-04
User type:
Private organization
|
Amount: 100,00€
Charging unit: Preparación equipo
|
|
Ref.: CAI TFQ UII-04
User type:
UCM
|
Amount: 13,00€
Charging unit: Depósito de SiO2 por cada 100 nm
|
|
Ref.: CAI TFQ UII-04
User type:
Public organization
|
Amount: 39,00€
Charging unit: Depósito de SiO2 por cada 100 nm
|
|
Ref.: CAI TFQ UII-04
User type:
Private organization
|
Amount: 130,00€
Charging unit: Depósito de SiO2 por cada 100 nm
|
|
Ref.: CAI TFQ UII-04
User type:
UCM
|
Amount: 15,00€
Charging unit: Depósito de Si3N4 por cada 100 nm
|
|
Ref.: CAI TFQ UII-04
User type:
Public organization
|
Amount: 45,00€
Charging unit: Depósito de Si3N4 por cada 100 nm
|
|
Ref.: CAI TFQ UII-04
User type:
Private organization
|
Amount: 150,00€
Charging unit: Depósito de Si3N4 por cada 100 nm
|
|
Ref.: CAI TFQ UII-04
User type:
UCM
|
Amount: 17,00€
Charging unit: Depósito de SiNO
|
|
Ref.: CAI TFQ UII-04
User type:
Public organization
|
Amount: 51,00€
Charging unit: V
|
|
Ref.: CAI TFQ UII-04
User type:
Private organization
|
Amount: 170,00€
Charging unit: Depósito de SiNO
|
|
CAI Physical Technologies
Ion Implantation Unit
|
